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In stock: 0
Equipment O3WG100/1 is used for the production of high purity DI water with controlled
concentrations of dissolved ozone in the water. The device can be used in the production of
semiconductors and displays for the cleaning of surfaces without the use of chemicals.
Output line has a maximum flow rate of up to 100 liters per minute. We also offer dual units with
two separate independently controlled ozone water units for use with multiple equipment or
for reaching higher flowrates.
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