Price: Not Announced
In stock: 0
Automatic spray procedure for cleaning silicon wafers up to 8" in diameter. Suitable for prediffusion cleaning, stripping in ozonated water and etching in HF or BOE. Small compact dimensions. Fast processing of the procedure. Safe operation. Low consumption of chemicals, especially in combination with our ozone water generator.
Features and Benefits
* available as optional accessories
** depending on used turntable configuration
Custom sized wafer carriers, casettes made of chemical resistant materials PP or PTFE Features and Benefits Fully custom sizes (metric & imperial) from ..... more
CSVG finished installation of testing Wet Bench System for demonstrating our processes like application of ozone water.
Fully operational refurbished spray systems FSI TITAN in stock with over 40% discount - for only 19,999 USD till the 31st ..... more
Technical and Test Institute for Construction Prague, accredited testing laboratory, branch office test institute of the light industries certifies usage of ..... more