Price: Not Announced
In stock: 0
Equipment HWG100/1 is used for the production of high purity DI water with controlled concentrations of dissolved hydrogen in the water. The device can be used in the production of semiconductors and displays for the cleaning of surfaces without the use of chemicals. Output line has a maximum flow rate of up to 100 liters per minute. We also offer dual units with two separate independently controlled hydrogen water units for use with multiple baths/equipment or for reaching higher flowrates.
Features and Benefits
Custom sized wafer carriers, casettes made of chemical resistant materials PP or PTFE Features and Benefits Fully custom sizes (metric & imperial) from ..... more
CSVG finished installation of testing Wet Bench System for demonstrating our processes like application of ozone water.
Fully operational refurbished spray systems FSI TITAN in stock with over 40% discount - for only 19,999 USD till the 31st ..... more
Technical and Test Institute for Construction Prague, accredited testing laboratory, branch office test institute of the light industries certifies usage of ..... more