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Equipment HWG100/1 is used for the production of high purity DI water with controlled concentrations of dissolved hydrogen in the water. The device can be used in the production of semiconductors and displays for the cleaning of surfaces without the use of chemicals. Output line has a maximum flow rate of up to 100 liters per minute. We also offer dual units with two separate independently controlled hydrogen water units for use with multiple baths/equipment or for reaching higher flowrates.
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