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Equipment HO3WG100/1 is used for the production of high purity DI water with controlled concentrations of dissolved hydrogen and ozone in the water. The device can be used in the production of semiconductors and displays for the cleaning of surfaces without the use of chemicals. This is a hybrid device that simultaneously produces both DI water with dissolved hydrogen and DI water with dissolved ozone. Each output line has a maximum flow rate of up to 100 liters per minute.
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